Conference paper information

Cumulative stress by ion implantation of Xe+. Si: A Molecular Dynamics approach

A. Moreno Barrado, M. Castro

19th International Conference on Ion Implantation Technology - IIIT, Valladolid (Spain). 25-29 June 2012

Publication date: 2012-06-25.

Citation:
A. Moreno Barrado, M. Castro, Cumulative stress by ion implantation of Xe+. Si: A Molecular Dynamics approach, 19th International Conference on Ion Implantation Technology - IIIT, Valladolid (Spain). 25-29 June 2012.

Research topics

*Mechanical Systems: Structural mechanics, Machinery components, Fast prototyping, Metrology